Modification of intrinsic defects in IZO/IGZO thin films for reliable bilayer thin film transistors

Nidhi Tiwari, Ram Narayan Chauhan, Po-Tsun Liu*, Han Ping D. Shieh

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

Dual active channel IZO/IGZO thin film transistors as such and with ZnO interlayer are fabricated and characterized to investigate the impact of ultra-thin ZnO insertion on their performance and bias stability. The ZnO interlayer suppresses the pre-existing divalent zinc vacancies and oxygen vacancies in the IZO front layer as systematically investigated by photoluminescence and XPS analysis. This interlayer leads to an enhancement of the electrical characteristics and stability of the bilayer TFT in comparison to the counterpart TFTs fabricated by a single IZO and a-IGZO-channel device. A high-field effect mobility (∼14 cm2 V-1 s-1) IZO/IGZO transistor with excellent photo-bias stability (ΔVth ∼ -2.45 V) was obtained from 2 nm ZnO insertion in between the IZO and IGZO layer-enabling backplane electronics for high-resolution and large-sized AMOLED and TFT-LCD displays.

Original languageEnglish
Pages (from-to)75393-75398
Number of pages6
JournalRSC Advances
Volume6
Issue number79
DOIs
StatePublished - 1 Jan 2016

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