MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications

Xiongfei Yu, Chunxiang Zhu*, Hang Hu, Albert Chin, M. F. Li, B. J. Cho, Dim Lee Kwong, P. D. Foo, M. B. Yu

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

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Physics & Astronomy

Chemical Compounds

Engineering & Materials Science