MIM capacitors using atomic-layer-deposited high-κ (HfO2)1-x(Al2O3)x dielectrics

Hang Hu*, Chunxiang Zhu, Xiongfei Yu, Albert Chin, M. F. Li, Byung Jin Cho, Dim Lee Kwong, P. D. Foo, Ming Bin Yu, Xinye Liu, Jerry Winkler

*Corresponding author for this work

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Engineering & Materials Science