Microlens array fabricated by excimer laser micromachining with gray-tone photolithography

Chung-Hao Tien*, Yeh En Chien, Yi Chiu, Han Ping D. Shieh

*Corresponding author for this work

Research output: Contribution to journalArticle

22 Scopus citations

Abstract

We demonstrate the fabrication of a refractive microlens array by using 248 nm excimer laser micromachining with coded gray-tone mask photolithography. With pre-corrections to the nonlinear exposure process, the maximum deviation from the designed shape was below 5%. The fabricated hemispherical lens of 30 μm radius was used as a solid immersion lens (SIL) and combined with a 0.54 numerical aperture (NA) objective to achieve a 0.87 effective NA through the knife-edge scanning test. The experimental results agreed with those of the simulation. Unlike the methods such as the thermal melting process, this one-step optical exposure method with a coded mask provides a relatively fast and cost-effective way to realize a microlens array in optical data storage, information processing, and optical interconnection applications.

Original languageEnglish
Pages (from-to)1280-1283
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number3
DOIs
StatePublished - 1 Mar 2003

Keywords

  • Excimer laser
  • Gray-tone photolithography
  • SIL

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