Micro-patterning of chemical functionality of anthracene-bis-resorcinol film using focused ion beam

Hiroyuki Yoshikawa*, Shuhei Namba, Yoshihiro Yokote, Yasuhiro Aoyama, Hiroshi Masuhara

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Anthracene-bis-resorcinol is an interesting molecule as it forms a hydrogen-bonded network when guest molecules with weak polarity are included. Focused ion beam (FIB) was irradiated on a part of its amorphous film with low dose, and the film was exposed to the vapor of guest molecules. From fluorescence and AFM analyses of this film, it was found that no inclusion compound was formed in FIB irradiated area, i.e. FIB irradiation suppresses the ability to form the inclusion compounds. By utilizing this phenomenon, we succeeded in a microfabrication of relief structures consisting of inclusion compounds which has different fluorescence from its surrounding. Morphology, fluorescence, and IR absorption analyses indicated that hydroxyl or resorcin groups are damaged by ion beams, and consequently a formation of hydrogen-bonded networks, which play a role of a lattice caging guest molecules, becomes impossible.

Original languageEnglish
Pages (from-to)2063-2070
Number of pages8
JournalApplied Surface Science
Volume252
Issue number5
DOIs
StatePublished - 15 Dec 2005

Keywords

  • Anthracene-bis-resorcinol
  • Atomic force microscope
  • Fluorescence spectrum
  • Focused ion beam
  • Inclusion compound

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