Micro knife-edge optical measurement devices fabricated by SOI and CMOS MEMS processes

Tzu Lin Chang*, Victor Farm Guoo Tseng, Yi Chiu

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The knife-edge method is a commonly used technique to characterize the optical profiles of laser beams or focused optical spots. In this paper, we present the design, fabrication, and test of a micro knife-edge scanner based on the micro-electromechanical-system (MEMS) technology. Silicon-on-insulator (SOI) processes are used to demonstrate the feasibility of the new device, whereas the CMOS-MEMS processes are used to enable the integration of the photo detector and on-chip signal conditioning circuitry. Focused optical spot size measured by the reflection-type SOI device is demonstrated to be close to the diffraction limit. Preliminary measurement results of the CMOS-MEMS device are also presented.

Original languageEnglish
Title of host publication2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
Pages31-32
Number of pages2
DOIs
StatePublished - 1 Dec 2007
Event2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS - Hualien, Taiwan
Duration: 12 Aug 200716 Aug 2007

Publication series

Name2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS

Conference

Conference2007 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OMENS
CountryTaiwan
CityHualien
Period12/08/0716/08/07

Keywords

  • CMOS MEMS
  • Diffraction limit
  • Focused optical spot
  • Knife edge
  • SOI

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