Micro knife-edge optical measurement device in a silicon-on-insulator substrate

Yi Chiu*, Jiun Hung Pan

*Corresponding author for this work

Research output: Contribution to journalArticle

13 Scopus citations

Abstract

The knife-edge method is a commonly used technique to characterize the optical profiles of laser beams or focused spots. In this paper, we present a micro knife-edge scanner fabricated in a silicon-on-insulator substrate using the micro-electromechanical-system technology. A photo detector can be fabricated in the device to allow further integration with on-chip signal conditioning circuitry. A novel backside deep reactive ion etching process is proposed to solve the residual stress effect due to the buried oxide layer. Focused optical spot profile measurement is demonstrated.

Original languageEnglish
Pages (from-to)6367-6373
Number of pages7
JournalOptics Express
Volume15
Issue number10
DOIs
StatePublished - 14 May 2007

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