Metal drift induced electrical instability of porous low dielectric constant film

Kuo Lung Fang*, Bing-Yue Tsui

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

25 Scopus citations

Abstract

A study was performed on the metal drift induced electrical instability of porous carbon doped oxide (CDO) film. An electrical instability model combining weak dielectric polarization and metal ions drift was proposed to explain the instability observed on the porous CDO films. It was found that the lacking formation of Al2O3 interfacial layer caused Al ions to migrate into CDO films.

Original languageEnglish
Pages (from-to)5546-5550
Number of pages5
JournalJournal of Applied Physics
Volume93
Issue number9
DOIs
StatePublished - 1 May 2003

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