Metal characterization and process enhancement techniques for photolithographic materials

Fu-Hsiang Ko, Hsuen Li Chen, Chun Chen Hsu, Tieh Chi Chu

Research output: Contribution to journalArticlepeer-review

Abstract

A high-throughput, one-step microwave technique was developed for the dissolution of photolithographic materials. The effects of dissolution temperature and digestion acid volume on the dissolution efficiency were systematically evaluated. By combining the proposed microwave digestion and inductively coupled plasma mass spectrometry techniques, the detection limits in the sub-ppb level and the analytical throughput up to 14 samples per hour were achieved for the analysis of nine metals. The novel process of using the identical bottom antireflective coating (BARC) material was applied to the KrF and ArF photoresist systems to reduce swing effect and surface reflectance on the substrate. It was found that the optimal thickness of the BARC film for the KrF and ArF photoresist systems were 62.5 nm and 119 nm, respectively.

Original languageEnglish
Pages (from-to)696-705
Number of pages10
JournalProceedings of SPIE-The International Society for Optical Engineering
Volume4689 II
DOIs
StatePublished - 1 Jan 2002

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