Mechanism and modeling of ring pattern formation for electron beam exposure on zwitterresist

Jem Kun Chen, Fu-Hsiang Ko*, Hsuen Li Chen, Feng Chih Chang

*Corresponding author for this work

Research output: Contribution to journalArticle

9 Scopus citations

Abstract

The novel sensitivity curve was determined for the zwitterresist. The irradiation dose in the center could create a ring pattern due to simultaneous exhibition of the positive tone and negative tone of zwitterresist. The natural logarithm dependence of ring width and electron beam dose was linear in two ranges, irrespective of the dot design radius. The heating effect was identified from 600 μC/cm2, while it could be neglected at less than 600 μC/cm2. Mathematical modeling for the prediction of ring width for zwitterresist was achieved by considering the electron scattering and heating effects. The results of experimental measurement and modeling on ring width showed a very good correlation.

Original languageEnglish
Pages (from-to)3838-3841
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume42
Issue number6 B
DOIs
StatePublished - 1 Jun 2003

Keywords

  • Electron beam
  • Heating effect
  • Ring pattern
  • Throughput
  • Zwitterresist

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