Material and ultrafast optoelectronic properties of furnace-annealed arsenic-ion-implanted GaAs

Gong Ru Lin*, Wen Chung Chen, C. S. Chang, Shyh Chin Chao, Kaung-Hsiung Wu, T. M. Hsu, W. C. Lee, Ci Ling Pan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Abstract

Structural, electrical, and ultrafast optical properties of furnace-annealed arsenic-ion-implanted GaAs (GaAs:AS +) has been investigated for its applications in ultrafast optoelectronics. From these studies, we determine that GaAs substrates implanted with 200-keV arsenic ions at 10 16 ions/cm 2 and furnace-annealed at 500 °C-600 ° C would have recovered its crystallinity, be highly resistive, and exhibit picosecond photo-excited carrier lifetimes. The duration of the electrical pulses generated by photoconductive switches (PCS's) fabricated on the optimized material was ≈4 ps, The risetime (10%-90%) and 1/e falltime were, respectively, ≈2 and 3 ps These results were measurement-system limited. We estimated the actual response to be ≈2 ps, consistent with a photo-excited carrier lifetime of ≈ ps. The peak responsivity was ≥4×10 -3 A/W. The dark current for the GaAs : As + PCS biased at 40 V was as low as 5 nA, The break down field was higher than 150 kV/cm. These characteristics are comparable to those of state-of-the-art photoconductors such as LT-GaAs.

Original languageEnglish
Pages (from-to)1740-1748
Number of pages9
JournalIEEE Journal of Quantum Electronics
Volume34
Issue number9
DOIs
StatePublished - 1 Sep 1998

Keywords

  • Arsenic-ion-implanted GaAs
  • Photocooductive switch
  • Ultrafast optoelectronics

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