Low Vt gate-first Al/TaN/[Ir3Si-HfSi 2-x]/HfLaON CMOS using simple laser annealing/reflection

C. C. Liao, Albert Chin, N. C. Su, M. F. Li, S. J. Wang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

18 Scopus citations

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Engineering & Materials Science