Low temperature processes of organic thin film transistor with gate dielectric of silicon dioxide deposited by scanning atmospheric-pressure technology

Kow-Ming Chang, S. S. Huang, C. H. Lin, S. H. Huang, Y. M. Wu, H. C. Pan, M. I. Hsu

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Fingerprint Dive into the research topics of 'Low temperature processes of organic thin film transistor with gate dielectric of silicon dioxide deposited by scanning atmospheric-pressure technology'. Together they form a unique fingerprint.

Engineering & Materials Science