Low-temperature laser processes for synthesizing (100)-textured Pb(Zr,Ti)O3 thin films on Si substrate

Ying-hao Chu, S. J. Lin*, K. S. Liu, I. N. Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Scopus citations


High-performance Pb(Zr,Ti)O3, PZT, thin films were synthesized on Si substrates by using low-temperature laser-assisted processes, which combine pulsed laser deposition (PLD), laser lift-off (LLO) and laser-annealing (LA) processes. The PZT films were first grown on sapphire substrates at 400 °C, using Ba(Mg1/3Ta2/3)O3, BMT, as seeding layer, by the PLD process, and were then transferred to Si substrates at room temperature by a LLO transferring process. Utilization of the BMT layer is of critical importance in those processes, since it acted as a nucleation layer for the synthesis of the PZT thin films on the sapphire substrates and, at the same time, served as a sacrificial layer during laser irradiation in the LLO process. After the LLO process, the surfaces of the PZT films were recovered by the LA process for removing the damage induced by the LLO process. A thin BMT (∼30 nm) layer is randomly oriented, resulting in non-textured PZT films with good ferroelectric properties, viz. Pr=20.6 μC/cm2 and Ec=126 kV/cm, whereas a thick BMT (∼100 nm) layer is (100) preferentially oriented, leading to (100)-textured PZT films with markedly better ferroelectric properties, viz. Pr=34.4 μC/cm2 and Ec=360 kV/cm.

Original languageEnglish
Pages (from-to)1059-1063
Number of pages5
JournalApplied Physics A: Materials Science and Processing
Issue number5
StatePublished - 1 Oct 2005

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