Low refractive index Si nanopillars on Si substrate

Gong Ru Lin*, Ya Chung Chang, En Shao Liu, Hao-Chung Kuo, Huang Shen Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

68 Scopus citations

Abstract

Low refractive index of a stalagmitelike high-aspect-ratio Si nanopillar array on Si dry etched using a self-aggregated Ni nanodot mask is demonstrated, which exhibits two minimum reflectances of 1.23 and 1.4 with corresponding refractive indices of 1.25 and 1.48 at 400 and 1200 nm, respectively. Angular dependency of the transverse electrical mode reflectance at 632.8 nm of the surface roughened Si nanopillar array is released, and the Brewster angle of 63° with equivalent refractive index of 1.5 is determined.

Original languageEnglish
Article number181923
JournalApplied Physics Letters
Volume90
Issue number18
DOIs
StatePublished - 10 May 2007

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