Low-frequency noise analysis of Si/SiGe channel pMOSFETs

Pei-Wen Li*, W. M. Liao

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


Low-frequency noise characteristics of 0.1 μm Si1-xGex channel pMOSFETs were studied by numerical simulations in the framework of the carrier number fluctuation model as well as the correlated fluctuation in the mobility model. Simulation results predict that Si1-xGex channel pMOSFETs could offer improved low-frequency noise performance as compared to the conventional bulk Si devices. This improvement in Si1-xGex channel pMOSFETs could be attributed to less effective oxide trap density for noise generation due to the increasing separation of quasi-Fermi level and valence band edge at Si-SiO2 interface by Ge-induced band offset.

Original languageEnglish
Pages (from-to)2281-2285
Number of pages5
JournalSolid-State Electronics
Issue number12
StatePublished - 1 Dec 2002


  • 1/f noise
  • Flicker noise
  • SiGe

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