Low-dielectric constant bisbenzo(cyclobutene) and fluorinated poly(arylene)ether films as bottom anti-reflective coating layers for ArF lithography

H. L. Chen*, T. C. Chu, M. Y. Li, Fu-Hsiang Ko, H. C. Cheng, T. Y. Huang

*Corresponding author for this work

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

A bottom anti-reflective coating (BARC) structure for ArF excimer laser lithography was demonstrated. The measured reflectance of lower than 1% on silicon substrates was achieved. By adding the BCB- and FLARE-based BARC layer, the swing effect was also significantly reduced.

Original languageEnglish
Pages (from-to)2381-2384
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number6
DOIs
StatePublished - 1 Nov 2001

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