Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

H. L. Chen*, Y. F. Chuang, C. C. Lee, C. I. Hsieh, Fu-Hsiang Ko, L. A. Wang

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Fingerprint Dive into the research topics of 'Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy