Localized joule heating as a mask-free technique for the local synthesis of ZnO nanowires on silicon nanodevices

C. C. Chen, Y. S. Lin, C. H. Sang, Jeng-Tzong Sheu*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

We report a mask-free technique for the local synthesis of ZnO nanowires (NWs) on polysilicon nanobelts and polysilicon NW devices. First, we used localized joule heating to generate a poly(methyl methacrylate) (PMMA) nanotemplate, allowing the rapid and self-aligned ablation of PMMA within a short period of time (ca. 5 μs). Next, we used ion-beam sputtering to prepare an ultrathin Au film and a ZnO seed layer; a subsequent lift-off process left the seed layers selectively within the PMMA nanotemplate. Gold nanoparticles and ZnO NWs were formed selectively in the localized joule heating region.

Original languageEnglish
Pages (from-to)4736-4741
Number of pages6
JournalNano Letters
Volume11
Issue number11
DOIs
StatePublished - 9 Nov 2011

Fingerprint Dive into the research topics of 'Localized joule heating as a mask-free technique for the local synthesis of ZnO nanowires on silicon nanodevices'. Together they form a unique fingerprint.

Cite this