Light enhancement of silicon-nanocrystal-embedded SiOx film on silicon-on-insulator substrate

Cheng Chang Chen*, Yung Hsaing Lin, M. H. Shih, Gong Ru Lin, Hao-Chung Kuo

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


We reported the light enhancement from a silicon-nanocrystal-embedded SiOx film on a silicon-on-insulator (SOI) substrate in the visible light range. The light emission from the annealed SiOx film is one order stronger than the emission from a nonannealed SiOx film. Compared with the SiOx film on a Si substrate, two-fold enhancement in light emission from the SiOx film on a SOI substrate was also observed. The enhancement was attributed to better vertical confinement of optical field in the SiOx film on a SOI substrate.

Original languageEnglish
Article number04DJ09
JournalJapanese journal of applied physics
Issue number4 PART 2
StatePublished - 1 Apr 2011

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