LESAR: A dynamic line-end spacing aware detailed router

Ying Chi Wei, Radhamanjari Samanta, Yih-Lang Li

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

As the VLSI technology scales down, 193nm optical lithography reaches the limit and one-dimensional (1D) unidirectional style lithography technique emerges as one of the most promising solutions for coming advanced technology nodes. The 1D process first generates unidirectional dense metal lines and then use line-end cutting to form the target patterns with cut masks. If cuts are too close, they will lead to conflicts. Line-end spacing rules become dynamic rather than static because of cut mask and also now need to be followed strictly. Line-end spacing check between two line-end pairs in the same mask has also been regarded as compulsory line-end spacing constraints that have not discussed in previous works yet. Complying with these rules during APR has become a new bottleneck. In this work, we propose to make the router aware of the dynamic line-end spacing rules, including end-end spacing and parity spacing constraints. Experimental results of our proposed router demonstrates that it can effectively expel all end-end spacing violations as well as 75% of parity spacing violations in a reasonable runtime increase of 14%.

Original languageEnglish
Title of host publicationProceedings of the 2018 Design, Automation and Test in Europe Conference and Exhibition, DATE 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1473-1476
Number of pages4
ISBN (Electronic)9783981926316
DOIs
StatePublished - 19 Apr 2018
Event2018 Design, Automation and Test in Europe Conference and Exhibition, DATE 2018 - Dresden, Germany
Duration: 19 Mar 201823 Mar 2018

Publication series

NameProceedings of the 2018 Design, Automation and Test in Europe Conference and Exhibition, DATE 2018
Volume2018-January

Conference

Conference2018 Design, Automation and Test in Europe Conference and Exhibition, DATE 2018
CountryGermany
CityDresden
Period19/03/1823/03/18

Keywords

  • cut mask
  • line-end spacing
  • manufacturability
  • Nanowire
  • routing

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