Laser machining of special designed photopolymers - Photochemical ablation mechanism

Thomas Lippert; J. T. Dickinson; S. C. Langford; H. Furutani; H. Fukumura; Hiroshi Masuhara; T. Kunz; A. Wokaun

doi:10.1117/12.308615

Laser machining of special designed photopolymers - Photochemical ablation mechanism

Thomas Lippert^*, J. T. Dickinson, S. C. Langford, H. Furutani, H. Fukumura, Hiroshi Masuhara, T. Kunz, A. Wokaun

^*Corresponding author for this work

Department of Applied Chemistry

Research output: Contribution to journal › Conference article › peer-review

Abstract

Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

Original language	English
Pages (from-to)	192-199
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	3404
DOIs	https://doi.org/10.1117/12.308615
State	Published - 1 Dec 1997
Event	ALT 1997 International Conference on Laser Surface Processing - Limoges, France Duration: 8 Sep 1997 → 12 Sep 1997

Keywords

Excimer laser
Laser ablation
Mechanism
Photopolymer
Triazenopolymer

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10.1117/12.308615

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title = "Laser machining of special designed photopolymers - Photochemical ablation mechanism",

abstract = "Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.",

keywords = "Excimer laser, Laser ablation, Mechanism, Photopolymer, Triazenopolymer",

author = "Thomas Lippert and Dickinson, {J. T.} and Langford, {S. C.} and H. Furutani and H. Fukumura and Hiroshi Masuhara and T. Kunz and A. Wokaun",

year = "1997",

month = dec,

day = "1",

doi = "10.1117/12.308615",

language = "English",

volume = "3404",

pages = "192--199",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "null ; Conference date: 08-09-1997 Through 12-09-1997",

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Laser machining of special designed photopolymers - Photochemical ablation mechanism. / Lippert, Thomas; Dickinson, J. T.; Langford, S. C.; Furutani, H.; Fukumura, H.; Masuhara, Hiroshi; Kunz, T.; Wokaun, A.

In: Proceedings of SPIE - The International Society for Optical Engineering, Vol. 3404, 01.12.1997, p. 192-199.

Research output: Contribution to journal › Conference article › peer-review

TY - JOUR

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AU - Lippert, Thomas

AU - Dickinson, J. T.

AU - Langford, S. C.

AU - Furutani, H.

AU - Fukumura, H.

AU - Masuhara, Hiroshi

AU - Kunz, T.

AU - Wokaun, A.

PY - 1997/12/1

Y1 - 1997/12/1

N2 - Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

AB - Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

KW - Excimer laser

KW - Laser ablation

KW - Mechanism

KW - Photopolymer

KW - Triazenopolymer

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