Laser machining of special designed photopolymers - Photochemical ablation mechanism

Thomas Lippert*, J. T. Dickinson, S. C. Langford, H. Furutani, H. Fukumura, Hiroshi Masuhara, T. Kunz, A. Wokaun

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

Abstract

Photopolymers based on the triazeno chromophore group (-N=N-N<) have been developed. The absorption properties can be tailored for a specific irradiation wavelength (e.g. 308 nm XeCl laser). The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 μm / pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces. The etching of the polymer starts and ends with the laser pulse, shown by ns-interferometry, confirming that the acting mechanism is mainly photochemical. TOF-MS revealed fragments which are also totally compatible with a photochemical decomposition mechanism.

Original languageEnglish
Pages (from-to)192-199
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3404
DOIs
StatePublished - 1 Dec 1997
EventALT 1997 International Conference on Laser Surface Processing - Limoges, France
Duration: 8 Sep 199712 Sep 1997

Keywords

  • Excimer laser
  • Laser ablation
  • Mechanism
  • Photopolymer
  • Triazenopolymer

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