Investigation of channel backscattering characteristics in nanoscale uniaxial-strained PMOSFETs

Wei Lee*, Pin Su

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

This paper examines channel backscattering characteristics for nanoscale strained and unstrained p-channel MOSFETs (PMOSFETs) using the experimentally extracted backscattering coefficients by our modified self-consistent temperature-dependent extraction method. Through comparing the gate voltage and temperature dependence, we demonstrate that channel backscattering can be reduced by the uniaxial strain for PFETs. Besides, we show that the strain-reduced conductivity effective mass may raise the thermal velocity, mean-free path, and effective mobility. Contrary to previous studies, our results indicate that the ballistic efficiency can be enhanced for compressive-strained PFETs. In addition, the backscattering effect on the electrostatic potential is discussed.

Original languageEnglish
Article number4813205
Pages (from-to)692-696
Number of pages5
JournalIEEE Transactions on Nanotechnology
Volume8
Issue number6
DOIs
StatePublished - 1 Nov 2009

Keywords

  • Ballistic transport
  • Channel backscattering
  • CMOS
  • Mobility
  • SiGe
  • Strained silicon

Fingerprint Dive into the research topics of 'Investigation of channel backscattering characteristics in nanoscale uniaxial-strained PMOSFETs'. Together they form a unique fingerprint.

Cite this