Investigation of backgate-biasing effect for ultrathin-body III-V heterojunction tunnel FET

Ming Long Fan, Vita Pi Ho Hu, Yin Nien Chen, Chih Wei Hsu, Pin Su, Ching Te Chuang

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


This paper investigates the impact of backgate biasing (V BS ) on the drain current (I D ) of ultrathin-body III-V heterojunction tunnel FET (HTFET). Compared with homojunction TFET and III-V/Ge MOSFET, this paper indicates that HTFET exhibits significantly higher I OFF (I D at V GS = 0 V and V DS = 0.5 V) modulation efficiency and the influence of V BS rapidly decreases with increasing V GS . In addition, it is observed that the change of source available states with V BS determines the I D modulation efficiency of p-type HTFET (pHTFET). Depending on the source doping concentration and operating V GS , the I D of HTFET under forward V BS can be anomalously smaller than that at V BS = 0 V. Furthermore, the impacts of source/drain doping concentrations and junction properties are discussed and shown to be critical in determining the I D modulation efficiency of HTFET. We find that, under controlled ambipolar current, reverse backgate biasing can be utilized to suppress the I OFF of HTFET, and the modulation efficiency increases with decreasing source doping concentration. Our study may provide insights for device/circuit designs with advanced TFET technologies.

Original languageEnglish
Article number6971207
Pages (from-to)107-113
Number of pages7
JournalIEEE Transactions on Electron Devices
Issue number1
StatePublished - 1 Jan 2015


  • Backgate biasing
  • heterojunction tunnel FET (HTFET)
  • ultrathin-body (UTB) structure

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