Inversion MOS capacitance extraction for ultra-thin gate oxide using BSIM4

Wei Lee*, Ke Wei Su, Chung Shi Chiang, Sally Liu, Pin Su

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations
Original languageEnglish
Title of host publication2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA - TECH, Proceedings of Technical Papers
Pages62-63
Number of pages2
DOIs
StatePublished - 31 Oct 2005
Event2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH - Hsinchu, Taiwan
Duration: 25 Apr 200527 Apr 2005

Publication series

Name2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH, Proceedings of Technical Papers

Conference

Conference2005 IEEE VLSI-TSA - International Symposium on VLSI Technology - VLSI-TSA-TECH
CountryTaiwan
CityHsinchu
Period25/04/0527/04/05

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