Original language | English |
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Pages (from-to) | 6255-6261 |
Number of pages | 7 |
Journal | Advanced Materials |
Volume | 26 |
Issue number | 36 |
DOIs | |
State | Published - 2014 |
Interface engineering for high-performance top-gated mos2 field-effect transistors
Xuming Zou, Jingli Wang, Chung Hua Chiu, Yun Wu, Xiangheng Xiao, Changzhong Jiang, Wen Wei Wu, Liqiang Mai, Tangsheng Chen, Jinchai Li, Johnny C. Ho*, Lei Liao
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review