Influence of post-annealing on the structural and nanomechanical properties of co thin films

Yeong Maw Hwang, Cheng Tang Pan, Ying Xu Lu, Sheng Rui Jian*, Huang Wei Chang*, Jenh Yih Juang

*Corresponding author for this work

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 °C to 800 °C. The XRD results indicated that for annealing temperature in the ranged from 300 °C to 500 °C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111) phases was evidently observed for films annealed at 600 °C. Further increasing the annealing temperature to 700 °C and 800 °C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young's modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.

Original languageEnglish
Article number180
JournalMicromachines
Volume11
Issue number2
DOIs
StatePublished - Feb 2020

Keywords

  • Co thin films
  • Nanoindentation
  • Pop-in
  • XRD

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