In-situ measurement of wafer camber by a laser-feedback detector

Tiziana Tambosso, Silvano Donati, Ray-Hua Horng

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Using a laser diode as an echo detector of the optical reflection from a wafer surface, we demonstrate a very compact and extremely simple optical probe capable of measuring the curvature radius of a wafer, inside an MOCVD chamber, on the range from a few meters to about 10 km.

Original languageEnglish
Title of host publication2014 IEEE Photonics Conference, IPC 2014
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages360-361
Number of pages2
ISBN (Electronic)9781457715044
DOIs
StatePublished - 22 Dec 2014
Event27th IEEE Photonics Conference, IPC 2014 - San Diego, United States
Duration: 12 Oct 201416 Oct 2014

Publication series

Name2014 IEEE Photonics Conference, IPC 2014

Conference

Conference27th IEEE Photonics Conference, IPC 2014
CountryUnited States
CitySan Diego
Period12/10/1416/10/14

Keywords

  • curvature measurement
  • proflometry
  • self-mixing interferometry
  • wafer characterization

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