In situ control of atomic-scale Si layer with huge strain in the nanoheterostructure NiSi/Si/NiSi through point contact reaction

Kuo Chang Lu, Wen-Wei Wu, Han Wei Wu, Carey M. Tanner, Jane P. Chang, Lih J. Chen*, King-Ning Tu

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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