Improving transport properties of GaN-based HEMT on Si (111) by controlling SiH4 flow rate of the SiNx nano-mask

Jin Ji Dai, Cheng Wei Liu, Ssu Kuan Wu, Sa Hoang Huynh, Jhen Gang Jiang, Sui An Yen, Thi Thu Mai, Hua Chiang Wen, Wu Ching Chou*, Chih Wei Hu, Rong Xuan

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The AlGaN/AlN/GaN high electron mobility transistor structures were grown on a Si (111) substrate by metalorganic chemical vapor deposition in combination with the insertion of a SiNx nano-mask into the low-temperature GaN buffer layer. Herein, the impact of SiH4 flow rate on two-dimensional electron gas (2DEG) properties was comprehensively investigated, where an increase in SiH4 flow rate resulted in a decrease in edge-type threading dislocation density during coalescence process and an improvement of 2DEG electronic properties. The study also reveals that controlling the SiH4 flow rate of the SiNx nano-mask grown at low temperatures in a short time is an effective strategy to overcome the surface desorption issue that causes surface roughness degradation. The highest electron mobility of 1970 cm2 /V·s and sheet carrier concentration of 6.42 × 1012 cm−2 can be achieved via an optimized SiH4 flow rate of 50 sccm.

Original languageEnglish
Article number16
Pages (from-to)1-10
Number of pages10
JournalCoatings
Volume11
Issue number1
DOIs
StatePublished - Jan 2021

Keywords

  • 2DEG
  • Edge threading dislocation
  • GaN HEMT
  • SiN nano-mask
  • V-defects

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