Improving spin-coating process using altered cover design

Chao Min Cheng*, Ren-Haw Chen

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

A novel work chamber cover design for a spin coater that can reduce the effect of airflow on spin coating is presented. The experimental results reveal that superior uniformity and film area can be obtained by utilizing the modified design instead of the conventional design.

Original languageEnglish
Pages (from-to)8028-8029
Number of pages2
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume43
Issue number12
DOIs
StatePublished - 1 Dec 2004

Keywords

  • Spin coating
  • Thick-film photoresist
  • Work chamber cover

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