Improved rear-side passivation by atomic layer deposition A 2 O 3 /SiN x stack layers for high V OC industrial p-type silicon solar cells

Je Wei Lin, Yi Yang Chen, Jon Yiew Gan, Wei Ping Hseih, Chen Hsu Du, Tien-Sheng Chao

Research output: Contribution to journalArticle

1 Scopus citations

Abstract

This research develops high open-circuit voltage (VOC)p-type industrial screen-printed silicon solar cells using improved rear surface passivation. It shows a significant improvement in the minority carrier lifetime by low temperature (< 450° C) thermal atomic layer deposition of Al 2 O 3 layers and plasma-enhanced chemical vapor deposition of SiN x passivation layers. An increase in the V OC and the short-circuit current (J SC ) due to an improved long-wavelength response are also demonstrated. With the optimized stack layers, a high efficiency of 19.2% across a large area (156 cm 2 ) is seen. Furthermore, the rear-side passivation scheme can be easily integrated into the conventional screen-printed process. This is very promising for in-line solar cell manufacturing.

Original languageEnglish
Article number6558507
Pages (from-to)1163-1165
Number of pages3
JournalIEEE Electron Device Letters
Volume34
Issue number9
DOIs
StatePublished - 3 Sep 2013

Keywords

  • Al O /SiN stack layers
  • negative fixed charge
  • open-circuit voltage
  • surface passivation

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