Impacts of work function variation and line edge roughness on hybrid TFET-MOSFET monolithic 3D SRAMs

Jian Hao Wang, Pin Su, Ching Te Chuang

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

We analyze the variability of 7T hybrid TFET-MOSFET SRAM and 8T MOSFET SRAM in monolithic 3D technology operating at ultra-low voltage. The impacts of work function variation (WFV) and line edge roughness (LER) on SRAM cell stability, leakage power and performance are investigated and compared using 3D atomistic TCAD mixed-mode Monte-Carlo simulations. The results indicate that WFV and LER have different impacts on read disturb and Vwrite,0, which dominate SRAM stability and is determined by the distinct current drive of TFET and MOSFET. The performance is influenced by the different variations of gate capacitance (Cg) under WFV and LER.

Original languageEnglish
Title of host publication2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781509058051
DOIs
StatePublished - 7 Jun 2017
Event2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017 - Hsinchu, Taiwan
Duration: 24 Apr 201727 Apr 2017

Publication series

Name2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017

Conference

Conference2017 International Symposium on VLSI Technology, Systems and Application, VLSI-TSA 2017
CountryTaiwan
CityHsinchu
Period24/04/1727/04/17

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