Hot-carrier induced instability of 0.5 μm CMOS devices patterned using synchrotron X-ray lithography

C. C.H. Hsu*, L. K. Wang, J. Y.C. Sun, M. R. Wordeman, T. H. Ning

*Corresponding author for this work

Research output: Contribution to conferencePaper

1 Scopus citations

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Engineering & Materials Science