Highly uniform and highly reliable 850 nm VCSEL platform for high-speed optical communications

Hao-Chung Kuo*, Z. Q. Shi, M. Trieu, X. Dong, G. Hasnain, C. P. Kuo, A. Liao

*Corresponding author for this work

Research output: Contribution to journalConference article


In this paper, we report a high performance, highly uniform, and highly reliable VCSEL platform at LuxNet Corporation. The proprietary design of this VCSEL gives it oxide VCSEL-like performance and an implant VCSEL-like reliability. Threshold currents are between 1.0 to 2.5 mA, and the slope efficiencies are between 0.3 to 0.5 W/A. The threshold current change with temperature is minimal and the slope efficiency change less than ∼30% when the substrate temperature is raised from 25°C to 90°C. The eye diagram of LuxNet TOSA operating at 2.5 GB/s with 6 mA bias and 10 dB extinction ratio shows very clean eye with jitter less than 30 ps. We have accumulated life test data up to 5000 hours at 100°C/20mA with exceptional reliability. And the WHTOL (85/85) bias at 8mA has passed over 3000 hours. In addition, the overall yield across a 3 inch wafer is over 90%. The chips are now being shipped in commercial quantities. Finally, we will present our preliminary results of 10 Gb/s VCSEL.

Original languageEnglish
Pages (from-to)304-309
Number of pages6
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - 1 Jan 2002
EventMaterials and Devices for optical and Wireless Communications - Shanghai, China
Duration: 15 Oct 200218 Oct 2002


  • OC-48
  • Vertical Cavity Surface Emitting Laser

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