Highly textured ZnO:B films grown by low pressure chemical vapor deposition for efficiency enhancement of heterojunction silicon-based solar cells

Jui Chung Hsiao, Chien Hsun Chen*, Hung Jen Yang, Chien Liang Wu, Chia Ming Fan, Chien Fu Huang, Chao Cheng Lin, Peichen Yu, Jenn Chang Hwang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

16 Scopus citations

Abstract

This paper demonstrates the growth of highly-textured boron-doped ZnO (ZnO:B) film by using low-pressure chemical-vapor-deposition (LPCVD) for efficient light harvesting and carrier collection in heterojunction silicon-based (HJS) solar cells. The optical and electrical characteristics have been optimized versus the substrate temperature and B 2 H 6 flow rate for tradeoffs among the sheet resistance, free-carrier absorption, and optical transmission of blue/green wavelengths. A HJS solar cell with a 1.6-μm-thick ZnO:B film achieves a high power conversion efficiency of 16.30% and fill factor of 78.05%, compared to 15.64% and 72.17%, respectively, from a counterpart with a conventional 80-nm-thick indium tin oxide layer.

Original languageEnglish
Pages (from-to)758-761
Number of pages4
JournalJournal of the Taiwan Institute of Chemical Engineers
Volume44
Issue number5
DOIs
StatePublished - 1 Sep 2013

Keywords

  • Heterojunction solar cell
  • Low-pressure chemical-vapor-deposition
  • ZnO:B

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