High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs

B. F. Hung*, C. H. Wu, Albert Chin, S. J. Wang, F. Y. Yen, Y. T. Hou, Y. Jin, H. J. Tao, Shih C. Chen, Mong Song Liang

*Corresponding author for this work

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Chemical Compounds

Engineering & Materials Science