High purity nano-crystalline carbon nitride films prepared at ambient temperature by ion beam sputtering

T. R. Lu, C. T. Kuo*, J. R. Yang, L. C. Chen, K. H. Chen, Teng-Ming Chen

*Corresponding author for this work

Research output: Contribution to journalArticle

19 Scopus citations

Abstract

High purity nano-crystalline carbon nitride films have been successfully deposited by ion beam sputtering. A novel bio-molecular C-N compound, 6-aminopurine, of which the characteristic features include covalent C-N bonding, high N/C ratio and a six-membered ring structure similar to that in the hypothetical C3N4 crystal, has been employed as the target material. The films can be deposited onto a variety of substrates, such as copper, silver, stainless steel, nickel and silicon wafer at ambient temperature. SAM examination indicates a high nitrogen-to-carbon ratio at about 0.51. XPS, IR and Raman studies reveal that the chemical bonding structures consist mainly of sp3-hybridized carbon as well as sp2-hybridized nitrogen and carbon. Both TEM and SAM mapping investigations indicate that the film contains a very dense and homogenous distribution of nano-crystalline grains. However, the structures of these crystals are yet to be determined since their TEM diffraction patterns only matched partially with the calculated pattern for β-C3N4.

Original languageEnglish
Pages (from-to)116-122
Number of pages7
JournalSurface and Coatings Technology
Volume115
Issue number2-3
DOIs
StatePublished - 18 Jul 1999

Keywords

  • Bio-molecular targets
  • Carbon nitride films
  • Ion beam sputtering
  • Nano-crystalline films

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