High precision patterning of ITO using femtosecond laser annealing process

Chung-Wei Cheng*, Cen Ying Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

High precision patterning of crystalline indium tin oxide (c-ITO) patterns on amorphous ITO (a-ITO) thin films by femtosecond laser-induced crystallization with a Gaussian beam profile followed by chemical etching is demonstrated. In the proposed approach, the a-ITO thin film is selectively transformed into a c-ITO structure via a low heat affect zone and the well-defined thresholds (ablation and crystallization) supplied by the femtosecond laser pulse. The experimental results show that by careful control of the laser fluence above the crystallization threshold, c-ITO patterns with controllable line widths and ridge-free characteristics can be accomplished. By careful control of the laser fluence above the ablation threshold, fast fabrication of the two parallel sub-micro c-ITO line patterns using a single femtosecond laser beam and single scanning path can be achieved. Along-length sub-micro c-ITO line pattern is fabricated, and the feasibility of fabricating c-ITO patterns is confirmed, which are expected to be used in micro-electronics devices.

Original languageEnglish
Pages (from-to)215-220
Number of pages6
JournalApplied Surface Science
Volume314
DOIs
StatePublished - 30 Sep 2014

Keywords

  • Annealing
  • Crystallization
  • Femtosecond laser
  • ITO
  • Patterning

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