High performance Metal-Gate/High-κ GaN MOSFET with good reliability for both logic and power applications

Shih Han Yi, Dun Bao Ruan, Shaoyan Di, Xiaoyan Liu, Yung Hsien Wu, Albert Chin*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The gate-recessed GaN MOSFET on a Si substrate is demonstrated to achieve a record highest normalized transistor current (μCox) of 335 μA/V2 (410 mA/mm at LG = 5 μm and only VG = 4 V), ION/IOFF of 9 orders of magnitude, small 79 mV/dec sub-threshold slope, a low oxide/GaN interface trap density of 1.2 × 1010 eV-1/cm2, a low on-resistance of 17.0 Ω-mm, a high breakdown voltage of 720970 V, and excellent reliability of only 40 mV ΔVT after 175 °C 1000 s stress at maximum drive current. Such excellent device integrities are due to the high-κ gate dielectric and the high conduction band offset (ΔEC) of SiO2/GaN. From the calculation results of self-consistent Schrödinger and Poisson equations, the good reliability of GaN MOSFET is related to the confined carrier density within the GaN channel, which is in sharp contrast to the strong wave-function penetration into the high-trap density AlGaN barrier in the AlGaN/GaN HEMT.

Original languageEnglish
Article number7527612
Pages (from-to)246-252
Number of pages7
JournalIEEE Journal of the Electron Devices Society
Volume4
Issue number5
DOIs
StatePublished - 1 Sep 2016

Keywords

  • GaN
  • MOSFET
  • high-κ
  • interface
  • reliability

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