High-density (4.4F 2 ) NAND flash technology using Super-Shallow Channel Profile (SSCP) engineering

F. Arai*, N. Arai, S. Satoh, T. Yaegashi, E. Kamiya, Y. Matsunaga, Y. Takeuchi, H. Kamata, A. Shimizu, N. Ohtani, N. Kai, S. Takahashi, W. Moriyama, K. Kugimiya, S. Miyazaki, T. Hirose, H. Meguro, K. Hatakeyama, K. Shimizu, Shirota Riichiro

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

13 Scopus citations

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