High-aspect-ratio sub-diffraction-limit objects fabricated with two-photon-absorption photopolymerization

Ying Ja Chen*, Yi-Chun Chen, Chau Hwang Lee, Jyhpyng Wang

*Corresponding author for this work

Research output: Contribution to conferencePaperpeer-review

2 Scopus citations

Abstract

High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.

Original languageEnglish
Pages252-253
Number of pages2
StatePublished - 1 Jan 2002
EventConference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States
Duration: 19 May 200224 May 2002

Conference

ConferenceConference on Lasers and Electro-Optics (CLEO 2002)
CountryUnited States
CityLong Beach, CA
Period19/05/0224/05/02

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