High-aspect-ratio micro-objects were fabricated via multiphoton-absorption photopolymerization using femtosecond lasers. A 100-MHz, 800-nm mode-locked Ti:sapphire laser oscillator was used as the light source. The femtosecond laser pulses were focused by a 0.85 numerical aperture, 60 X objective lens, onto the photoresist. Micro-objects with lateral dimension, 35% the diffraction limit and an aspect ratio close to 4 were produced.
|Number of pages||2|
|State||Published - 1 Jan 2002|
|Event||Conference on Lasers and Electro-Optics (CLEO 2002) - Long Beach, CA, United States|
Duration: 19 May 2002 → 24 May 2002
|Conference||Conference on Lasers and Electro-Optics (CLEO 2002)|
|City||Long Beach, CA|
|Period||19/05/02 → 24/05/02|