Growth of aligned carbon nanotubes on ALD-Al2O3 coated silicon and quartz substrates

Hengzhi Wang, Qingjun Cai, Chung-Lung Chen, Dezhi Wang, Zhifeng Ren*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

The smooth surface of the amorphous Al2O3 film on either silicon or quartz,coated by atomic layer deposition (ALD), was changed to rough surface byannealing in either air or hydrogen at high temperature (745°C) due to theformation of nanosized pinholes and micrometre pimples during the crystallisationof the amorphous Al2O3. The rough surface makes the growth of longcarbon nanotubes (CNTs) by chemical vapour deposition impossible.Nevertheless, we were able to develop new catalyst recipes for successfulgrowth of vertically aligned CNTs on ALD-Al2O3 coated silicon and quartzsubstrates. The lengths of the CNTs reached 90 mm on silicon substrates and180 mm on quartz substrates. Furthermore, it is observed that the adhesion ofCNTs on silicon substrates is much stronger than that on quartz substrates.

Original languageEnglish
Pages (from-to)464-472
Number of pages9
JournalJournal of Experimental Nanoscience
Volume6
Issue number5
DOIs
StatePublished - 1 Oct 2011

Keywords

  • Alumina
  • Atomic layer deposition
  • Carbon nanotube
  • Chemical vapour deposition

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