Grating Pitch Measurement Beyond the Diffraction Limit with Modified Laser Diffractometry

Shan-Peng Pan*, Tzong-Shi Liu, Min-Ching Tasi, Huay-Chung Liou

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations

Abstract

The demand for accurate measurements of nanostructures is increasing for the microprocesses and nanotechnology used in the semiconductor industry. In this study, we present an improved method for measuring gratings with a pitch size lower than one-half of the laser wavelength by using a modified laser diffractometer (LD). In experiments, the modified LD with a 633nm laser is used to measure a grating with a 288nm pitch size. This result is compared with results measured by both a metrological atomic force microscope and the traditional LD with a 543nm laser. The validity of this method is demonstrated. The difference between the pitch size of 288nm obtained by these three methods is approximately 0.17 nm. (C) 2011 The Japan Society of Applied Physics
Original languageEnglish
Article number06GJ04
JournalJapanese Journal of Applied Physics
Volume50
Issue number6
DOIs
StatePublished - Jun 2011
Event23rd International Microprocesses and Nanotechnology Conference (MNC 2010) - Fukuoka, Japan
Duration: 9 Nov 201012 Nov 2010

Keywords

  • SCANNING-ELECTRON-MICROSCOPE; CALIBRATION; METROLOGY; ACCURATE; AFM

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