As scaling continues, attention is returning to germanium and Ge-on-insulator (GOI) MOSFETs. Why? Is Ge technology a viable alternative or a fanciful diversion? This session will debate these questions? Are Ge MOSFETs more scalable? Are high-k dielectrics an enabler for Ge? Will GOI be cost-effective? In what circuits are the benefits of Ge technology most pronounced: low power, high performance, memory, optoelectronics?
|Number of pages||1|
|Journal||Device Research Conference - Conference Digest, DRC|
|State||Published - 1 Dec 2004|
|Event||Device Research Conference - Conference Digest, 62nd DRC - Notre Dame, IN, United States|
Duration: 21 Jun 2004 → 23 Jun 2004