Future of silicon integrated circuit technology

Hiroshi Iwai*

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

CMOS technology has been developed into the sub-100 nm range. It is expected that the nano-CMOS technology will governed the IC manufacturing for at least another couple of decades. Though there are many challenges ahead, further down-sizing the device to a few nanometers is still on the schedule of International Technology Roadmap for Semiconductors (ITRS). Several technological options for manufacturing nano-CMOS microchips have been available or will soon be available. This paper reviews the challenges of nano-CMOS downsizing and manufacturing. We shall focus on the recent progress on the key technologies for the nano-CMOS IC fabrication in the next fifteen years.

Original languageEnglish
Title of host publicationICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007, Conference Proceedings
Pages571-576
Number of pages6
DOIs
StatePublished - 2007
EventICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007 - Peradeniya, Sri Lanka
Duration: 9 Aug 200711 Aug 2007

Publication series

NameICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007, Conference Proceedings

Conference

ConferenceICIIS 2007 - 2nd International Conference on Industrial and Information Systems 2007
CountrySri Lanka
CityPeradeniya
Period9/08/0711/08/07

Fingerprint Dive into the research topics of 'Future of silicon integrated circuit technology'. Together they form a unique fingerprint.

Cite this