Formation of nano-crystalline Si quantum dots in ZnO thin-films using a ZnO/Si multilayer structure

Kuang Yang Kuo, Shu Wei Hsu, Wen Ling Chuang, Po-Tsung Lee*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

In this study, we propose to fabricate ZnO thin-films with nano-crystalline Si (nc-Si) quantum dots (QDs) embedded using a ZnO/Si multilayer structure by radio-frequency (RF) magnetron sputtering method. Our results show that a high Si sputtering power (P Si) can assist the formation of self-aggregated Si nano-clusters during deposition, which is helpful for the crystallization of nc-Si QDs and ZnO matrix during annealing. Great crystallinity and highly uniform size of nc-Si QDs are obtained for P Si of 110 W. We experimentally demonstrate the formation of nc-Si QDs embedded in crystalline ZnO thin-films, which has a great potential for various electro-optical device applications.

Original languageEnglish
Pages (from-to)463-465
Number of pages3
JournalMaterials Letters
Volume68
DOIs
StatePublished - 1 Feb 2012

Keywords

  • Si quantum dot
  • Sputtering
  • Thin-films
  • ZnO

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