Formation of CH3 radicals in the decomposition of trimethyl aluminum on hot solid surfaces

D. W. Squire*, C. S. Dulcey, Ming-Chang Lin

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

32 Scopus citations

Abstract

The thermal decomposition of trimethyl aluminum on different hot substrates has been studied under low-pressure conditions. The products of the decomposition reaction were analyzed mass-spectrometrically using electron-impact and resonance-enhanced multiphoton ionization. The results of this study reveal that only CH3 appears as a gas-phase product and stable compounds such as CH4 and C2H6 are not observed under the conditions employed. The apparent activation energy for the production of the CH3 radical from the Al-coated hot substrates is measured to be 11 ± 2 kcal/mole.

Original languageEnglish
Pages (from-to)525-528
Number of pages4
JournalChemical Physics Letters
Volume116
Issue number6
DOIs
StatePublished - 24 May 1985

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