FinFET scaling to 10 nm gate length

Bin Yu, Leland Chang, Shibly Ahmed, Haihong Wang, Scott Bell, Chih Yuh Yang, Cyrus Tabery, Chau Ho, Qi Xiang, Tsu Jae King, Jeffrey Bokor, Chen-Ming Hu, Ming Ren Lin, David Kyser

Research output: Contribution to journalArticle

486 Scopus citations

Fingerprint Dive into the research topics of 'FinFET scaling to 10 nm gate length'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy