Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs

Rong Jhe Lyu, Horng-Chih Lin, Ming Hung Wu, Bo Shiuan Shie, Hsiang Ting Hung, Tiao Yuan Huang

Research output: Chapter in Book/Report/Conference proceedingConference contribution

10 Scopus citations

Abstract

A film profile engineering (FPE) concept which utilizes the unique features of various deposition tools to tailor and optimize the profile of the deposited films was demonstrated with the fabricated ZnO TFTs. By implementing the PR trimming technique, high performance devices with L < 100 nm can be readily achieved.

Original languageEnglish
Title of host publication2013 IEEE International Electron Devices Meeting, IEDM 2013
DOIs
StatePublished - 1 Dec 2013
Event2013 IEEE International Electron Devices Meeting, IEDM 2013 - Washington, DC, United States
Duration: 9 Dec 201311 Dec 2013

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference2013 IEEE International Electron Devices Meeting, IEDM 2013
CountryUnited States
CityWashington, DC
Period9/12/1311/12/13

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    Lyu, R. J., Lin, H-C., Wu, M. H., Shie, B. S., Hung, H. T., & Huang, T. Y. (2013). Film profile engineering (FPE): A new concept for manufacturing of short-channel metal oxide TFTs. In 2013 IEEE International Electron Devices Meeting, IEDM 2013 [6724607] (Technical Digest - International Electron Devices Meeting, IEDM). https://doi.org/10.1109/IEDM.2013.6724607